ArF Photoresist
Xuzhou Bokang is a Chinese supplier of photoresist from raw materials to finished products.
1. Representative products of resin monomers, including styrene-based photoresist resin monomers; adamantane series methacrylate/acrylate photoresist monomers; cyclohexane series methacrylate/acrylate photoresist monomers; cyclopentane series methacrylate/acrylate photoresist monomers; BARC photoresist monomers.
2. Representative products of photoresist, including ArF photoresist, KrF photoresist, i-line photoresist, packaging resist, electron beam glue and other series of products, are used in IC integrated circuit manufacturing photolithography, IC back-end Packaging, semiconductor discrete devices and other manufacturing processes.
3. Representative products of photoacid generators, including ionic sulfonium salt photoacid generators; ionic iodonium salt photoacid generators; non-ionic photoacid generators.
Product Name | HTA2031 | |
Exposure wavelength | 193nm IMM | |
Technical nodes and applications | N40nm-14nm PTD C/H | |
Process capability CD | 0.045um | |
Process capability THK | 0.08~0.10um |