KrF Photoresist
Xuzhou Bokang is a Chinese supplier of photoresist from raw materials to finished products.
PHS resin system, including high activation energy positive resist, low activation energy positive resist and negative resist, has the advantages of high resolution, etching resistance and ion implantation resistance. Thin resist is characterized by high resolution, which can reach HP120nm, thick resist is characterized by high aspect ratio, AR can reach 12:1, and has entered the client verification. At present, nearly 20+ KrF products have been verified and sold in Chinese 12-inch Fab.
| Exposure wavelength | Product Name | Technical nodes and applications | Process capability CD | Process capability THK | Image |
|---|---|---|---|---|---|
| 248nm | HTK1061 | N40-14nm KrF L/S (IMP,Etch) | 0.12um | 0.20-0.30um |  |
| 248nm | HTK1062 | N40-14nm KrF L/S (IMP,Etch) | 0.14um | 0.17-0.24um |  |
| 248nm | HTK1063 | N40-14nm KrF L/S (IMP,Etch) | 0.16um | 0.22-0.32um |  |
| 248nm | HTK1064 | N40-28nm KrF L/S (Etch) | 0.16um | 0.35-0.54um |  |
| 248nm | HTK1065 | N65/55nm KrF L/S (IMP) | 0.16um | 0.24-0.34um |  |
| 248nm | HTK1066 | N65/55nm KrF L/S (IMP) | 0.16um | 0.33-0.48um |  |
| 248nm | HTK1067 | N40-14nm KrF L/S (IMP) | 0.16um | 0.33-0.48um |  |
| 248nm | HTK1075 | N40nm-14nm KrF L/S (IMP,Etch) | 0.20um | 0.65-0.95um |  |
| 248nm | HTK1082 | N40nm-14nm KrF L/S (IMP,Etch) | 0.30um | 0.80-1.20um |  |
| 248nm | HTK3001 | N90-14nm KrF L/S, C/H (IMP,Etch) | 0.32um | 1.0-1.5um |  |
| 248nm | HTK5001 | 3DNAND Step Etching/High Energy Ion Implantation | 1.70um | 3.0-5.0um |  |
| 248nm | HTK510 | Etching | 2um | 3.0-5.0um |  |
| 248nm | HTK516-1 | PAD | 0.6um | 1.0-2.0um |  |
| 248nm | HTK516-2 | PAD | 1um | 1.5-3.0um |  |
| 248nm | HTKN601-0.4 | Compound semiconductor (Metal lift-off, KrF negative photoresist) | 0.2um | 0.3-0.6um |  |
