I-LINE Photoresist
Xuzhou Bokang is a Chinese supplier of photoresist from raw materials to finished products.
Focusing on the chemical amplification resist of PHS resin system, including positive resist and negative resist, the thickness range covers 0.3~20um, and has the advantages of high transparency, high aspect ratio, high throughput, etc. Currently, there are 15+ products in the verification and sales in Chinese IC factories.
Exposure wavelength | Product Name | Technical nodes and applications | Process capability CD | Process capability THK | Image |
---|---|---|---|---|---|
I-line 365nm | HTI560-0.3 | KRF backup | 0.35um | 0.2-0.4um | |
I-line 365nm | HTI560-0.6 | IC general purpose | 0.45um | 0.6-0.9um | |
I-line 365nm | HTI560-1 | IC general purpose | 0.5um | 0.8-1.2um | |
I-line 365nm | HTI560-2 | IC general purpose | 0.6um | 2.1-3.0um | |
I-line 365nm | HTI560-3A | IC general purpose | 1um | 2.9-4.0um | |
I-line 365nm | HTI560-5D | IC general purpose | 0.8um | 4.0-7.5um | |
I-line 365nm | HTI560-8 | IC general purpose, TSV | 2um | 6.0-8.0um | |
I-line 365nm | HTI560-20C | Advanced Packaging Die Cutting | 5um | 10-17um | |
I-line 365nm | HTI751 | IC general purpose | 0.5um | 0.7-1um | |
I-line 365nm | HTIN174 | Compound semiconductor metal lift-off | 2um | 2.5-5.5um (4inch) | |
I-line 365nm | HTIN1710 | Compound semiconductor metal lift-off | 6um | 6-12um | |
I-line 365nm | HTIN160 | Compound semiconductor metal lift-off | 0.5um | 0.8-7um | |
I-line 365nm | HTIN683 | MEMS, micron devices | 5um@THK 40um | 8-60um | |
I-line 365nm | HTIN161 | IC general purpose | 0.5um | 1um |