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Entire industry chain model of photoresist, full category of semiconductor photoresist

ArF PhotoresistKrF PhotoresistI-LINE PhotoresistE-beam Photoresist Encapsulation Photoresist

I-LINE Photoresist

Xuzhou Bokang is a Chinese supplier of photoresist from raw materials to finished products.

1. Representative products of resin monomers, including styrene-based photoresist resin monomers; adamantane series methacrylate/acrylate photoresist monomers; cyclohexane series methacrylate/acrylate photoresist monomers; cyclopentane series methacrylate/acrylate photoresist monomers; BARC  photoresist monomers.

2. Representative products of photoresist, including ArF photoresist, KrF photoresist, i-line photoresist, packaging resist, electron beam glue and other series of products, are used in IC integrated circuit manufacturing photolithography, IC back-end Packaging, semiconductor discrete devices and other manufacturing processes.

3. Representative products of photoacid generators, including ionic sulfonium salt photoacid generators; ionic iodonium salt photoacid generators; non-ionic photoacid generators.

Product Name HTIN1710
Exposure wavelength I-line 365nm
Technical nodes and applications Compound semiconductor metal lift-off
Process capability CD 6um
Process capability THK 6-12um
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