E-beam Photoresist
Xuzhou Bokang is a Chinese supplier of photoresist from raw materials to finished products.
It can provide products in different systems such as PMMA, PHS, P(MCA/MST), HSQ, etc., including two types of positive and negative, with the advantages of high resolution and etch resistance. The technology and production capacity have reached the international level, and it is currently the only company in China that can provide electron beam resist. Entered sales in 2015, serving more than 15+ customers.
| Exposure wavelength | Product Name | Technical nodes and applications | Process capability CD | Process capability THK | Image |
|---|---|---|---|---|---|
| E-beam photoresist | RE209 | Micro-nano processing | 0.012um | 0.24um |  |
| E-beam photoresist | RE300 series | Micro-nano processing | 0.05um | 0.12-0.6 |  |
| E-beam photoresist | RE650 | Micro-nano processing | 0.04um | 0.2-0.3um |  |
| E-beam photoresist | RE500 | Micro-nano processing | 0.02um | 0.12um |  |
| E-beam photoresist | NRE800 | Micro-nano processing | 0.03um | 0.2-0.35um |  |
5 Records
